Ion & Electron Sources
Scienta Omicron offers a selection of Ion and Electron Sources to suit a range of applications from sample cleaning and depth profiling. We also offer a variety of electron sources for tailored system solutions and for research groups which build custom setups based on components. Our offering includes electron sources suitable for scanning electron microscopy (SEM) and acquisition of Auger data when combined with a suitable energy analyser. In addition, we offer a monochromated electron source in combination with our 2D analysers enabling high resolution electron energy loss spectroscopy (HREELS). HREELS is a surface sensitive technique and used to characterise vibrations of adsorbed species, surface phonons, and plasmons.
Find the source for your application below and contact us for detailed information.
The MCES150 is a collimated and monochromatic electron source with an extremely narrow energy distribution. This type of source forms the base for a high resolution electron energy loss spectroscopy (HREELS). The combination with a Scienta Omicron high resolution ARPES analyser creates an efficient platform for vibrational spectroscopy and phonon dispersion measurements.
The FDG 150 is a differentially pumped fine-focus ion source suitable for XPS and AES depth profiling, sputter cleaning and charge neutralisation with slow, positively charged ions. Advanced features like a regulated gas inlet, keystone correction, intermediate acceleration of slow ions set the FDG 150 apart from other depth profiling sources.
The FDG 15 ion source is designed to clean samples for surface analysis, to perform simple depth profiling, to act as an excitation source for ISS/LEIS experiments and optionally to provide slow ions (<15 eV), e.g. for charge neutralisation in ESCA.
We offer the complete range of substrate preparation systems, including MBE, PLD, Sputtering and other techniques. Each thin film solution is prepared to and can be easily upgraded with more than 30 support techniques in-situ surface analysis. This system is designed to fulfil the highest and most stringent requirements of modern thin film deposition.