The HIS 14 HD Product  | © Scienta Omicron
The HIS 14 HD VUV source with focusing mirror.
Technical drawing of the HIS 14 HD mounted to another component  | © Scienta Omicron
Example of a mounted HIS 14 HD.
Focus VUV Source  | © Scienta Omicron
The modern, low noise digital power supply provides up to 300 mA discharge current. The power supply supports the automatic plasma ignition and a Pirani pressure gauge.


Small Beam-Spot VUV Source with High Flux Density


  • Focusing optics ensures light spot diameter < 300 μm
  • 50 times higher photon flux compared to unfocussed source
  • Photon line width < 2 meV (He I radiation)
  • Low noise digital power supply

The HIS 14 HD VUV light source is ideally suited for ultraviolet photoelectron spectroscopy experiments which require small excitation area (ARPES) and high photon flux (PEEM). 

The HIS 14 HD is an extended version of the well-established FOCUS HIS 13. The small spot of 300 μm makes the HIS 14 HD ideal for ARPES or PEEM applications where high flux densities into a small area are mandatory.

Robust water cooled design with direct-sight connection between the discharge area and the target for easy alignment.

A port aligner facilitates the positioning of the light spot on the sample in a range of ± 3°. For dedicated ARPES experiments there is an optional third pumping stage available for operation in the 10-10 mbar range. The focusing of the light spot down to 300 μm is realised with state of the art synchrotron beam line optics technology. The photo current into 300 μm spot is > 30 nA (biased Al foil).

The HIS 14 HD is mounted on a flange CF 63 ID (optional: CF 100 ID) and comes with an customised adaptor flange to adapt the HIS 14 HD to the customer's experiment (chamber drawing to be provided by the customer).

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Photo current

> 20 nA (biased Al foil, standard capillary)

Useful gas discharge lines:

He I/II, Ne I/II, Ar I/II, Kr I/II, Xe I/II, H (Lyα, Lyβ)

Spot diameter

< 300 μm (FWHM; 5:1 demagnifying optics)

Photon line width

< 2 meV (He I radiation)

Photon flux density

> 50 times compared to an unfocused source

Source alignment

CF 63 port aligner


2- or 3-stage differential pumping

Working distance

Ca. 70 mm (clearance to measurement position)

Insertion depth

Customised (to be defined)

Mounting flange

DN 63 CF or DN 100 CF

Operating pressure

Down to 10-10 mbar range

Adjustment & Discharge control

Via backside viewport


Water cooling

Bake out temperature

Up to 250 °C

Plasma Ignition


Capillary (mm)

0.8 / 1.2 / 1.7 (standard) / 2.2

For full specifications and more information about product options, please do not hesitate to contact your local sales representative. Find the contact details here: Contact Us 

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