Electron Beam Induced Deposition
Electron Beam Induced Deposition (EBID) is a lithographic technique, in which a fine focused electron beam is used to write two- and three-dimensional solid structures on surfaces. The electron beam, typically originating from an electron microscopy source, is used to decompose co- or predeposited precursor molecules that contain non-volatile atoms, e.g. iron pentacarbonyl, leaving solid deposits behind. Due to the high lateral resolution with which the electron beam can be scanned across surfaces (typically in the nm regime), highly resolved solid structures can be created from the non-volatile deposits. The key fact is, that no permanent deposits are created on sites that are not touched by the electron beam.