10 kV Gas Cluster Ion Beam System
- Depth profiling analysis of polymers with minimal loss of chemical information
- Ultimate depth profiling performance in combination with XPS and other surface analysis systems
- Sample current imaging
- Built in time of flight calibration feature
We offer the complete range of substrate preparation systems, including MBE, PLD, Sputtering and other techniques. Each thin film solution is prepared to and can be easily upgraded with more than 30 support techniques in-situ surface analysis. This system is designed to fulfil the highest and most stringent requirements of modern thin film deposition.
The GCIB 10S is designed for ultimate depth profiling performance in combination with XPS and other surface analysis systems.
Cluster ion beams enable depth profiling analysis of polymers with minimal loss of chemical information due to ion beam damage. This is crucial in analysis of modern multi-layer structures, such as in OLED, bio medical, sensitive coatings devices or other polymer surfaces, but also shows a marked improvement in analysis of well-established materials which can degrade during normal profiling with Ar1.
Beyond using the argon cluster ion source in combination with new XPS systems the GCIB 10S can also be easily integrated into existing UHV systems with a suitable NW63CF flange aiming at the sample. It provides an economical means of upgrading XPS, SIMS or other systems to use cluster beam sputtering for sample cleaning or depth profile analysis.
Nondestructive Depth Profiling of Polystyrene on Kapton
Depth Profiling using Ar4000 N1s and O1s
Sample Current Imaging
Depth profiling using Ar4000
Time of Flight Cluster Measurement
A time of flight calibration feature is also built in, for accurate set up of cluster size. A selection of cluster beams are available, ranging from Ar1 to > Ar3000, with typical beam currents of up to 15 nA for the larger clusters.