The Highest Purity Electron Beam Evaporator for Thin Film Growth
- Ultra-pure evaporation and very low back-ground pressure
- Evaporation area Ø 10 - 50 mm
- Flux monitor and integrated shutter
- Rear-loading of evaporation material as rod or in crucible
- Ease-of-operation with Lab VIEW TM –based Epitass® software
- Crucible temperature display
Based on the famous EFM 3 the EFM4/4s electron beam evaporators are designed for evaporation from wires, rods or crucibles. The 3 different exit apertures though allow to cover a larger sample area up to 50 mm. Besides this all other features of the EFM 3 are preserved.
The EFM e-beam evaporators originally have been designed for ultra-pure evaporation of magnetic materials such as Fe, Co, Cr, Mn and Ni as sub-monolayer and multilayer thin films. Meanwhile the successful design concept has a proven record for basically all metals, semiconductors, several insulators and even organic material/individual molecules.
A careful choice of material composing the EFM, its proprietary water cooling concept combined with an integrated and T/C controlled degassing up to 250 °C enables evaporation in ultra-high vacuum (to below 10-10 mbar) and prevents cross-talk between sequentially evaporated substances. This together with the robust and compact design and high quality manufacturing makes the EFM-series a valuable long term investment and ideally suited for multi-user facilities.
The latest generation of EVC power supplies provides advanced filament control to 1 mA which allows to precisely regulate crucible temperatures down to 100 °C e.g. for evaporation of molecules. Between 100 °C and 800 °C the temperature stability is 0.1 °C or better. The crucible temperature is determined and displayed with high precision based on a proprietary algorithm using power, filament current, crucible size and position as input.
Today more than 2000 instruments are used in virtually every surface science research lab making sure that there is a set of parameters/recipes available for basically every evaporation request and compatible equipment is always at hand.
Evaporator Characteristics & Results
EFM-Series Spot Profiles
Reproducable and Stable Flux Control
Deposition area vs. distance to sample
Electronics & Software
The microprocessor controlled EVC power supplies in combination with the Epitass® software make the operation of all EFM-type UHV evaporators very convenient and safe. With up to 300 W power and up to 2 kV output they are sufficient for the evaporation of any desired material.
The EVC power supply provides a regulated fi lament emission current down to 1 mA in order to precisely regulate crucible temperatures down to 100 °C e.g. for molecules (see front page). Between 100 °C and 800 °C the temperature stability is 0.1 °C or better.
As a unique feature Epitass® software has a temperature display providing the actual crucible temperature.
The EVC 100 and 300-2 power supplies come with full flux regulator in addition to the emission current regulator which can be programmed for constant flux or integral flux values.
All parameters of the EVC power supplies including those for the optional motorised shutter can be set manually on the front panel or via the Lab VIEW™-based Epitass® software.
For Multilayer growth or co-evaporation from different cells several EVC power supplies need to be controlled. This functionality is provided by the MultiEpitass® software which can control up to four different cells mastering the individual Epitass® software of each EVC power supply. The MultiEpitass® is an option or part of an EFM 3T-EVC 300-2 package. All evaporators can be equipped with a motorised shutter which is either mounted at the factory or can easily be refitted by the customer.
The option Ion suppression adds an electrode to the EFM 4: EFM 4s, where s stands for suppression. A part of the evaporant beam in all products of the EFM-series is ionised by the electron bombardment during heating. Most of these ions are captured by the flux monitor electrode. As the evaporant is on high voltage with respect to the grounded sample the remaining ions may create defects in the substrate surface and deposit energy. To generate a 100 % neutral beam an additional voltage is applied at the suppressor electrode of the EFM 4s. The additional voltage is supplied by the power supply EVC 300s-2 or EVC 100s. Upgrade packages for existing EFM 4 are available on request. All other features of the EFM 4 are fully preserved.
The EFM e-beam evaporators originally have been designed for ultra-pure evaporation of magnetic materials such as Fe, Co, Cr, Mn and Ni as sub-monolayer and multilayer thin films. Materials like Pt, Ag, Au, Al, Ti, Ta, W and semiconductors, e.g. silicon, can be evaporated with the highest purity. Recent innovations allow using the EFM 3 for a broader range of materials than ever before. The 2 kV – now standard - for example ensures high growth rates even for materials like C, W, Ti, Ta and other elements relevant to grow 2 D materials. In order to handle larger rods an optional 50 mm z-shift is available.
Other materials are:
- Organics (down to individual molecules)
- Insulators such as CaF2
100 °C - 3300 °C
Rods and crucibles
Ø 10 – 50 mm
Integral part of base package
Up to 250 °C
Co-deposition package with shutter motor and multi-pocket control
For full specifications and more information about product options, please do not hesitate to contact your local sales representative.